Three-Dimensional Simulation of Anisotropic Wet Chemical Etching Process
نویسندگان
چکیده
In this paper, we present result on the development of a simulation tool for the three-dimensional anisotropic wet chemical etching of bulk silicon etching or bulk micromaching. As a test of our simulation tool, we present several simulation results. Several simulation results demonstrate our simulation tool which is quite efficient for the design and development of MEMS device structure. The developed simulator demonstrates the applicability of complex three-dimensional MEMS device structures. We demonstrate the simulation of the anisotropic wet chemical etching process of basic exemplary structures featuring the virtual fabrication of an industrial MEMS structure manufactured by means of bulk micromachining.
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